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Ion Implantation and Annealing Applications, Science and Technology

 Author: Wilfried Lerch, Michael Current  Publisher: Springer  Published: February 3, 2026  ISBN: 3032100070  Share:
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 About this book:

This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing.

It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology. This edition, enriched by expert contributions, serves as an essential reference for students and professionals in materials science and microelectronics.

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